@Article{MorelhãoFornRappAbra:2017:NaChBi,
author = "Morelh{\~a}o, S. L. and Fornari, Celso Israel and Rappl, Paulo
Henrique de Oliveira and Abramof, Eduardo",
affiliation = "{Universidade de S{\~a}o Paulo (USP)} and {Instituto Nacional de
Pesquisas Espaciais (INPE)} and {Instituto Nacional de Pesquisas
Espaciais (INPE)} and {Instituto Nacional de Pesquisas Espaciais
(INPE)}",
title = "Nanoscale characterization of bismuth telluride epitaxial layers
by advanced X-ray analysis",
journal = "Journal of Applied Crystallography",
year = "2017",
volume = "50",
pages = "399--410",
keywords = "bismuth telluride, model structure simulation, nanostructured
domains, three-dimensional reciprocal-space maps, X ray
diffraction.",
abstract = "The surface properties of topological insulators are strongly
correlated with their structural properties, requiring
high-resolution techniques capable of probing both surface and
bulk structures at once. In this work, the high flux of a
synchrotron source, a set of recursive equations for fast X-ray
dynamical diffraction simulation and a genetic algorithm for data
fitting are combined to reveal the detailed structure of bismuth
telluride epitaxial films with thicknesses ranging from 8 to
168\ nm. This includes stacking sequences, thickness and
composition of layers in model structures, interface coherence,
surface termination, and morphology. The results are in agreement
with the surface morphology determined by atomic force microscopy.
Moreover, by using X-ray data from a zero-noise area detector to
construct three-dimensional reciprocal-space maps, insights into
the nanostructure of the domains and stacking faults in Bi2Te3
films are given.",
doi = "10.1107/S1600576717000760",
url = "http://dx.doi.org/10.1107/S1600576717000760",
issn = "0021-8898",
language = "en",
urlaccessdate = "27 abr. 2024"
}